Multi-Beam Scanning Electron Microscope Design
نویسندگان
چکیده
منابع مشابه
Parallel electron-beam-induced deposition using a multi-beam scanning electron microscope
Lithography techniques based on electron-beam-induced processes are inherently slow compared to light lithography techniques. The authors demonstrate here that the throughput can be enhanced by a factor of 196 by using a scanning electron microscope equipped with a multibeam electron source. Using electron-beam induced deposition with MeCpPtMe3 as a precursor gas, 14 14 arrays of Pt-containing ...
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ژورنال
عنوان ژورنال: Microscopy and Microanalysis
سال: 2016
ISSN: 1431-9276,1435-8115
DOI: 10.1017/s143192761600372x